Raised via for terminal connections on different planes

ABSTRACT

A method includes forming a metal layer extending into openings of a dielectric layer to contact a first metal pad and a second metal pad, and bonding a bottom terminal of a component device to the metal layer. The metal layer has a first portion directly underlying and bonded to the component device. A raised via is formed on the metal layer, and the metal layer has a second portion directly underlying the raised via. The metal layer is etched to separate the first portion and the second portion of the metal layer from each other. The method further includes coating the raised via and the component device in a dielectric layer, revealing the raised via and a top terminal of the component device, and forming a redistribution line connecting the raised via to the top terminal.

PRIORITY CLAIM

This application is a continuation of U.S. patent application Ser. No.15/640,949, entitled “Raised-Via for Terminal Connections on DifferentPlanes,” filed Jul. 3, 2017, which claims the benefit of the followingprovisionally filed U.S. Patent application: Application Ser. No.62/450,786, filed Jan. 26, 2017, and entitled “Raised-Via for TerminalConnections on Different Planes,” which applications are herebyincorporated herein by reference.

BACKGROUND

Passive devices are commonly used in integrated circuits. Passivedevices may include capacitors, inductors, or the like. These devicessometimes require large chip area, and are sometimes handled differentlyfrom other types of devices such as transistors and resistors. Forexample, the passive devices may be formed as discrete device dies,which may be bonded on package substrates, Printed Circuit Boards(PCBs), or packages.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1 through 11 illustrate the cross-sectional views of intermediatestages in the formation of a package integrated with a component devicein accordance with some embodiments.

FIGS. 12 and 13 illustrate the cross-sectional views of intermediatestages in the formation of a package integrated with a component devicein accordance with some embodiments.

FIGS. 14 through 18 illustrate the cross-sectional views of intermediatestages in the formation of a device die and a component device at a topportion of the device die in accordance with some embodiments.

FIGS. 19 through 21 illustrate the cross-sectional views of intermediatestages in the formation of a package integrated with a component devicein accordance with some embodiments.

FIGS. 22 through 31 illustrate the cross-sectional views of intermediatestages in the formation of a package integrated with a component deviceformed on a separate chip in accordance with some embodiments.

FIGS. 32A and 32B illustrate a cross-sectional view and a top view of acomponent device in accordance with some embodiments.

FIG. 33 illustrates a process flow for forming a package in accordancewith some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the invention. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact. In addition,the present disclosure may repeat reference numerals and/or letters inthe various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between thevarious embodiments and/or configurations discussed.

Further, spatially relative terms, such as “underlying,” “below,”“lower,” “overlying,” “upper” and the like, may be used herein for easeof description to describe one element or feature's relationship toanother element(s) or feature(s) as illustrated in the figures. Thespatially relative terms are intended to encompass differentorientations of the device in use or operation in addition to theorientation depicted in the figures. The apparatus may be otherwiseoriented (rotated 90 degrees or at other orientations) and the spatiallyrelative descriptors used herein may likewise be interpretedaccordingly.

Packages including device dies integrated with component devices and themethod of forming the same are provided in accordance with variousexemplary embodiments. The intermediate stages of forming some packagesare illustrated in accordance with some embodiments. Some variations ofsome embodiments are discussed. Throughout the various views andillustrative embodiments, like reference numbers are used to designatelike elements.

FIGS. 1 through 11 illustrate the cross-sectional views of intermediatestages in the formation of a package in accordance with some embodimentsof the present disclosure. The steps shown in FIGS. 1 through 11 arealso reflected schematically in the process flow 200 as shown in FIG.33.

FIG. 1 illustrates a cross-sectional view of wafer 2. In accordance withsome embodiments of the present disclosure, wafer 2 includes activedevices such as transistors and/or diodes, and possibly passive devicessuch as capacitors, inductors, resistors, or the like. In accordancewith alternative embodiments of the present disclosure, packagecomponent 2 is an interposer wafer, which does not include activedevices, and may or may not include passive devices. Wafer 2 includes aplurality of chips 10.

Wafer 2 may include semiconductor substrate 20 and the features formedat a top surface of semiconductor substrate 20. Semiconductor substrate20 may be formed of silicon, germanium, silicon germanium, and/or aIII-V compound semiconductor such as GaAsP, AlInAs, AlGaAs, GaInAs,GaInP, GaInAsP, or the like. Semiconductor substrate 20 may also be abulk silicon substrate or a Silicon-On-Insulator (SOI) substrate.Shallow Trench Isolation (STI) regions (not shown) may be formed insemiconductor substrate 12 to isolate the active regions insemiconductor substrate 20.

In accordance with some embodiments of the present disclosure, wafer 2includes integrated circuit devices (circuits) 22, which are formed onthe top surface of semiconductor substrate 20. Exemplary integratedcircuit devices 22 include Complementary Metal-Oxide Semiconductor(CMOS) transistors, resistors, capacitors, diodes, and the like. Thedetails of integrated circuit devices 22 are not illustrated herein. Inaccordance with alternative embodiments, wafer 2 is used for forminginterposers, wherein substrate 20 may be a semiconductor substrate or adielectric substrate.

Inter-Layer Dielectric (ILD) 24 is formed over semiconductor substrate20 and fills the space between the gate stacks of transistors (notshown) in integrated circuit devices 22. In accordance with someexemplary embodiments, ILD 24 is formed of Tetra Ethyl Ortho Silicate(TEOS) oxide (SiO₂), Phospho-Silicate Glass (PSG), Boro-Silicate Glass(BSG), Boron-doped Phospho-Silicate Glass (BPSG), Fluorine-DopedSilicate Glass (FSG), or the like. ILD 24 may be formed using spincoating, Flowable Chemical Vapor Deposition (FCVD), or the like. Inaccordance with alternative embodiments of the present disclosure, ILD24 is formed using a deposition method such as Plasma-Enhanced ChemicalVapor Deposition (PECVD), Low Pressure Chemical Vapor Deposition(LPCVD), or the like.

Contact plugs 28 are formed in ILD 24, and are used to electricallyconnect integrated circuit devices 22 to overlying metal lines and vias.In accordance with some embodiments of the present disclosure, contactplugs 28 are formed of a conductive material selected from tungsten,aluminum, copper, titanium, tantalum, titanium nitride, tantalumnitride, alloys therefore, and/or multi-layers thereof. The formation ofcontact plugs 28 may include forming contact openings in ILD 24, fillinga conductive material(s) into the contact openings, and performing aplanarization (such as Chemical Mechanical Polish (CMP) or mechanicalgrinding) to level the top surfaces of contact plugs 28 with the topsurface of ILD 24.

Over ILD 24 and contact plugs 28 is interconnect structure 30.Interconnect structure 30 includes metal lines 34 and vias 36, which areformed in dielectric layers 32. The combination of metal lines at a samelevel is referred to as a metal layer hereinafter. In accordance withsome embodiments of the present disclosure, interconnect structure 30includes a plurality of metal layers that are interconnected throughvias 36. Metal lines 34 and vias 36 may be formed of copper or copperalloys, and they can also be formed of other metals. In accordance withsome embodiments of the present disclosure, dielectric layers 32 areformed of low-k dielectric materials. The dielectric constants (kvalues) of the low-k dielectric materials may be lower than about 3.0,or lower than about 2.5, for example.

Dielectric layers 32 are alternatively referred to as Inter-MetalDielectric (IMD) layer 32 hereinafter. In accordance with someembodiments of the present disclosure, IMD layers 32 are formed of alow-k dielectric material(s) having a dielectric constant(s) (k-value)lower than about 3.0, about 2.5, or lower. IMD layers 32 may be formedof Black Diamond (a registered trademark of Applied Materials Inc.), acarbon-containing low-k dielectric material, Hydrogen Silses-Quioxane(HSQ), Methyl-Silses-Quioxane (MSQ), or the like. In accordance withsome embodiments of the present disclosure, the formation of IMD layers32 includes depositing a porogen-containing dielectric material and thenperforming a curing process to drive out the porogen, and hence theremaining IMD layers 32 are porous.

The formation process of metal lines 34 and vias 36 may include singledamascene and/or dual damascene processes. In an exemplary singledamascene process, a trench is first formed in one of IMD layers 32,followed by filling the trench with a conductive material. Aplanarization step such as CMP is then performed to remove the excessportions of the conductive material higher than the top surface of theIMD layer, leaving a metal line in the trench. In a dual damasceneprocess, both a trench and a via opening are formed in an IMD layer,with the via opening underlying and connected to the trench. Aconductive material is then filled into the trench and the via openingto form a metal line and a via, respectively. The conductive materialmay include a diffusion barrier layer and a copper-containing metallicmaterial over the diffusion barrier layer, wherein the barrier layer mayinclude titanium, titanium nitride, tantalum, tantalum nitride, or thelike.

Passivation layer 40 (sometimes referred to as passivation-1) may beformed over interconnect structure 30, wherein vias 44 are formed inpassivation layer 40 to electrically connect metal lines 34 and vias 36to overlying metal pads.

Metal pads 42 (including 42A, 42B, 42C, and 42D, which are collectivelyreferred to as metal pads 42) are formed over passivation layer 40, andmay be electrically coupled to integrated circuit devices 22 throughvias 44 in passivation layer 40, and through metal lines 34 and vias 36in accordance with some exemplary embodiments. Metal pads 42 may bealuminum pads or aluminum-copper pads, and other metallic materials maybe used. The electrical coupling from metal pads 42B, 42C, and 42D tointegrated circuit devices 22 are schematically represented by dashedlines 38.

Passivation layer 46 (sometimes referred to as passivation-2) is formedover passivation layer 40. Some portions of passivation layer 46 maycover the edge portions of metal pads 42, and central portions of metalpads 42 are exposed through the openings in passivation layer 46. Eachof passivation layers 40 and 46 may be a single layer or a compositelayer, and may be formed of a non-porous material. In accordance withsome embodiments of the present disclosure, one or both of passivationlayers 40 and 46 is a composite layer including a silicon oxide layer(not shown), and a silicon nitride layer (not shown) over the siliconoxide layer. Passivation layers 40 and 46 may also be formed of othernon-porous dielectric materials such as Un-doped Silicate Glass (USG),silicon oxynitride, and/or the like.

Dielectric layer 48 is formed over passivation layer 46. In accordancewith some embodiments of the present disclosure, dielectric layer 48 isa polymer layer, and hence is referred to as polymer layer 48 throughoutthe description, while it can be formed of an inorganic dielectricmaterial such as silicon nitride, silicon oxide, or the like. Polymerlayer 48 may be formed of polyimide, PolyBenzOxazole (PBO),BenzoCycloButene (BCB), or the like. The formation methods may includespin coating, for example. Polymer layer 48 may be dispensed in aflowable form, and then cured. Polymer layer 48 is patterned to exposethe center portions of metal pads 42.

Next, as shown in FIG. 2, metal layer 50 is formed to fill the openingsin polymer layer 48. Metal layer 50 is in contact with the top surfacesof metal pads 42. The respective step is shown as step 202 in theprocess flow illustrated in FIG. 33. In accordance with some embodimentsof the present disclosure, the formation of metal layer 50 includesdepositing a seed layer (not shown), and then plating a metal layer overthe seed layer. The seed layer may include a titanium layer and a copperlayer (both may be conformal layers) over the titanium layer. The seedlayer may be deposited using Physical Vapor Deposition (PVD). The platedconductive material over the seed layer may include a copper layer, agold layer, or may a copper layer and a gold layer over the copperlayer. The plating may be performed using, for example, Electro-ChemicalPlating (ECP) or Electro-less (E-less) plating. The plated metal layer50 may be a blanket layer covering the entire wafer 2. After theplating, a planarization such as CMP or mechanical grinding step isperformed to form a planar top surface for metal layer 50. In accordancewith some embodiments in which metal layer 50 includes a copper layerand a gold layer, the planarization may be performed first to generate aplanar surface that is higher than the top surface of polymer layer 48.After the CMP, the gold layer is formed, and hence will be a planarlayer.

Referring to FIG. 3, raised via 52, which is alternatively referred toas a metal post, is formed. The respective step is shown as step 204 inthe process flow illustrated in FIG. 33. In accordance with someembodiments of the present disclosure, mask layer 54, which may be aphoto resist, is formed and patterned, exposing a portion of metal layer50. Raised via 52 is then formed, for example, through ECP or E-lessplating. Height H1 of raised via 52 may be greater than about 5 μm, andmay be in the range between about 5 μm and about 50 μm. Raised via 52may be formed of copper, aluminum, titanium, titanium nitride, nickel,gold, multi-layers thereof, and/or alloys thereof. In accordance withsome embodiments of the present disclosure, raised via 52 is formed of asame material as the underlying contacting portion of metal layer 50,and there may, or may not, be a distinguishable interface therebetween.In accordance with alternative embodiments, raised via 52 and metallayer 50 are formed of different materials. Raised via 52 and metallayer 50 may also include same types of elements such as aluminum and/orcopper, but have different percentages. After the formation of raisedvia 52, mask layer 54 is removed.

FIG. 4 illustrates the bonding of component devices 56A and 56B(collectively referred to component devices 56) to metal layer 50. Therespective step is shown as step 206 in the process flow illustrated inFIG. 33. Component devices 56 are sometimes referred to as Surface MountDevices (SMDs) since they are formed close to the top surfaces of chips10. Component devices 56 are also sometimes referred to as IntegratedPassive Devices (IPDs), which include passive devices therein. Inaccordance with some exemplary embodiments, component devices 56 includecapacitors, inductors, resistors, diodes (such as photo diodes) therein.Furthermore, one or more of component devices 56 may be single-devicecomponents, each including a capacitor, an inductor, a diode, or thelike, and does not include other active devices (such as transistors) orpassive devices.

Each of component devices 56 includes two terminals (such as 60 and 66)at different planes, which include a plane of the top surface and aplane of the bottom surface of the respective component device 56. Thetwo terminals 60 and 66 are connected to the two capacitor electrodeswhen the respective component device 56 is a capacitor. The twoterminals are connected to the two ends of a coil when the respectivecomponent device 56 is an inductor. The two terminals are connected tothe anode and the cathode when the respective component device 56 is adiode. FIG. 32A illustrates a cross-sectional view of an exemplarycomponent device 56 including capacitor 58 therein, which includesbottom electrode 58A, capacitor insulator 58B, and top electrode 58C.Bond layer 60 is electrically connected to bottom capacitor electrode58A through conductive layer 62 in accordance with some embodiments, andacts as a bottom terminal of the component device. Top terminal 66 iselectrically connected to top capacitor electrode 58C, for example,through conductive layer 64. Capacitor 58 (or other types of devices)may be formed in dielectric layers 59.

FIG. 32B illustrates a top view of component device 56 in accordancewith some embodiments of the present disclosure. Top terminal 66 may beformed as a ring in accordance with some embodiments, or formed as asolid metal pad. For example, if component device 56 includes a photodiode or a light-emitting diode, the region surrounded by thering-shaped top terminal 66 may be used to allow light to be received bycomponent device 56, or used to allowing light to be emitted out ofcomponent device 56. Accordingly, although FIG. 4 shows that there aretwo top terminals 66, the two illustrate top terminals 66 may be theparts of the same ring-shaped top terminal. In accordance withalternative embodiments, component device 56 may include two or more topterminals 66 that are not electrically shorted.

In accordance with some embodiments, depending on the material and thestructure of bottom terminals 60, which act as the bond layers, thebonding may be direct metal-to-metal bonding such as copper-to-copperbonding or gold-to-gold bonding, solder bonding, or the like.Accordingly, one bond layer 60 may include a metal layer directly joinedto metal layer 50. When bond layer 60 does not include solder, thenon-solder metal layer in bond layer 60 is directly bonded to metallayer 50. When bond layer 60 includes a solder layer, the solder layeris between, and contacts, both the non-solder metal layer in bond layer60 and metal layer 50.

Next, referring to FIG. 5, an etching step is performed to remove theportions of metal layer 50 not covered by component devices 56 andraised via 52. The respective step is shown as step 208 in the processflow illustrated in FIG. 33. In accordance with some embodiments of thepresent disclosure, the etching includes wet etch or dry etch. As aresult of the etch, bond pads 50A and 50C, which are the remainingportions of metal layer 50, are formed, and are connected to theoverlying bottom terminals 60. Bond pad 50B is left underlying raisedvia 52. As a result of the etch, undercuts may be formed, wherein bondpads 50A, 50B, and 50C are laterally recessed from the respective edgesof the overlying devices/features 56 and 52. For example, dashed lines55 schematically illustrate the shapes of the edges of conductive layers52A and 52C when the undercuts occurs. Depending on the materials ofbottom terminals 60, terminals 60 may or may not have undercuts relativeto the edges of the overlying dielectric layers in the respectivecomponent device 56. In addition, if the material of raised via 52 isdifferent from that of bond pad 50B, similar undercuts may also beformed in bond pad 50B. As a result of the etching of metal layer 50,the portions of metal layer 50 covering metal pad 42D are also removed,and metal pad 42D is also revealed.

FIG. 6 illustrates the coating of devices with dielectric layer 70,which may be formed of a polymer such as polyimide, PBO, or BCB. A lightplanarization may be performed to planarize the top surface ofdielectric layer 70. The top surface of dielectric layer 70 is higherthan the top surfaces of component devices 56 and raised via 52, andhence component devices 56 and raised via 52 are encapsulated indielectric layer 70. The respective step is shown as step 210 in theprocess flow illustrated in FIG. 33. Next, as shown in FIG. 7,dielectric layer 70 is patterned to form openings 72, through which topterminals 66 are revealed. The respective step is shown as step 212 inthe process flow illustrated in FIG. 33. The patterning may be performedthrough etching in a photolithography process. In the same process forforming openings 72, opening 73 is also formed to reveal metal pad 42Dagain. In accordance with alternative embodiments in which dielectriclayers 48 and 70 have similar etching properties, the opening 73 mayhave the shape as shown by dashed lines 71.

Next, as shown in FIG. 8, raised via 52 is revealed. The respective stepis also shown as step 212 in the process flow illustrated in FIG. 33.The exemplary process may include a blanket etching back of dielectriclayer 70, a CMP on dielectric layer 70, or a mechanical grinding ondielectric layer 70. If the etching back is adopted, the top surface ofraised via 52 may be higher than the top surface of the etcheddielectric layer 70 when the etching back is finished. The top surfaceof raised via 52 may also be level with the top surface of dielectriclayer 70 when the CMP or mechanical grinding is performed.

FIG. 9 illustrates the formation of redistribution line 74. Therespective step is shown as step 214 in the process flow illustrated inFIG. 33. An exemplary formation process includes depositing a seedlayer, forming a patterned mask layer (not shown) such as photo resistover the seed layer, plating (for example, using ECP) the redistributionline 74, removing the patterned mask layer, and removing the portions ofthe seed layer not covered by the redistribution lines. Redistributionline 74 contacts the top surface of raised via 52, and electricallyconnects top terminal 66 of component device 56A to metal pad 42B. Inaccordance with alternative embodiments, redistribution line 74 isformed by blanket depositing a metal layer, and then patterning themetal layer through etching. Redistribution line 74 may be formed ofcopper, aluminum, nickel, palladium, or alloys thereof.

It is noted that although not shown, there may be a redistribution lineconnected to the top terminal 66 of component device 56B. However, sincethe redistribution line is formed in a plane other than what isillustrated, the redistribution line is not visible. Similarly, the topterminal 66 of component device 56B may also be connected to anotherraised via that is formed simultaneously as the illustrated raised via52.

Next, as shown in FIG. 10, passivation layer 76 is formed to isolateredistribution line 74 and top terminal 66 from outside environment. Therespective step is shown as step 216 in the process flow illustrated inFIG. 33. In accordance with some embodiments of the present disclosure,passivation layer 76 is formed of a polymer such as polyimide or PBO, oran inorganic material such as silicon oxide, silicon nitride, ormulti-layers thereof. In a subsequent step, wafer 2 is singulated alongscribe lines 78 to separate chips 10 from each other, wherein chips 10have the identical structures. The respective step is shown as step 218in the process flow illustrated in FIG. 33.

FIG. 11 illustrates the bonding of chip 10, for example, through wirebonding, so that package 82 is formed. The respective step is shown asstep 220 in the process flow illustrated in FIG. 33. In accordance withsome embodiments, the back surface of chip 10 is adhered to anotherpackage component (not shown) such as a package substrate, a printedcircuit board, or a lead frame through an adhesive film (not show). Chip10 is then bonded to the package component, wherein wire bond structure80, which includes bond ball 80A and metal wire 80B attached to bondball 80A, is formed to electrically connect metal pad 42D to the packagecomponent. Chip 10 along with the wire bond structure 80 may then beencapsulated, for example, in an encapsulating material such as amolding compound (not shown).

FIGS. 12 through 31 illustrate cross-sectional views of intermediatestages in the formation of packages in accordance with some embodimentsof the present disclosure. Unless specified otherwise, the materials andthe formation methods of the components in these embodiments areessentially the same as the like components, which are denoted by likereference numerals in the embodiments shown in FIGS. 1 through 11. Thedetails regarding the formation process and the materials of thecomponents shown in FIGS. 12 through 31 may thus be found in thediscussion of the embodiment shown in FIGS. 1 through 11.

FIGS. 12 and 13 illustrate the intermediate stages in the formation of apackage in accordance with alternative embodiments. These embodimentsare similar to the embodiments shown in FIGS. 1 through 11 except thatthe steps shown in FIGS. 7 and 8 are replaced by a single etching stepto reveal both top terminals 66 and raised via 52 at the same time, asshown in FIG. 12. In the etching of dielectric layer 70, opening 75 isformed simultaneously as openings 72 and 73. Opening 75 extends intodielectric layer 70 and reveals the top surface of raised via 52. FIG.13 illustrates the resulting package 82 in accordance with theseembodiments, wherein redistribution line 74 extends into the opening 75(FIG. 12) to contact raised via 52.

FIGS. 14 through 18 illustrate the intermediate stages in the formationof a package in accordance with alternative embodiments. Theseembodiments are similar to the embodiments shown in FIGS. 1 through 11except that instead of bonding pre-formed component devices 56,component devices 56 are in-situ formed over wafer 2. The initial stepsare similar to what are shown in FIGS. 1 and 2. After the wafer 2 asshown in FIG. 2 is formed, bottom terminals 60 are formed. The formationprocess may be similar to the process for forming redistribution lines74, and hence is not repeated.

Referring to FIG. 15, bottom terminals 60 is formed in layer 61, whichmay be a dielectric layer or a semiconductor layer (such as apolysilicon layer or crystalline silicon layer). When layer 61 is asemiconductor layer, dielectric layers (not shown) are formed as ringsto encircle bottom terminals 60 in order to electrically insulate bottomterminals 60 from the semiconductor substrate. Next, conductive layers62, which may be formed of copper, aluminum, or the like, are formed andpatterned. In subsequent processes, as shown in FIG. 16, the devicessuch as passive devices or diodes are formed. In accordance with someembodiments, capacitors 58 are formed, which are embedded in dielectriclayers 59 extending throughout wafer 2.

FIG. 17 illustrates the formation of top terminals 66, which again maybe formed using a process similar to the formation of redistributionlines 74. It is appreciated that the structures of component device 56may be different from what are illustrated. For example, layers 60, 62,and 64 may be omitted, while bond pads 50A and 50C may act as the bottomcapacitor electrodes, while capacitor insulators 58B may be formeddirectly over and contacting bond pads 50A and 50C, so that thestructure of component devices 56 is simplified. In the subsequent step,layers 61 and 59, which extend on the entire wafer 2, are etched in aphotolithography process, so that component devices 56 are separatedfrom each other. The resulting wafer 2 is shown in FIG. 18.

In a subsequent step, raised via 52 is formed on the structure shown inFIG. 18, and the resulting structure will be similar to what is shown inFIG. 4. The steps shown in FIGS. 5 through 11 may then be performed tofinish the formation of the package.

FIGS. 19 through 21 illustrate the intermediate stages in the formationof a package in accordance with alternative embodiments. Theseembodiments are similar to the embodiments shown in FIGS. 1 through 11,except that the steps shown in FIGS. 7 and 8 are replaced with the stepsshown in FIGS. 19 and 20. The initial steps are similar to what areshown in FIGS. 1 through 6. After the wafer 2 as shown in FIG. 6 isformed, a CMP or a mechanical grinding is performed to thin dielectriclayer 70, until both top terminals 66 and raised via 52 are revealed, asshown in FIG. 19. Accordingly, the top surfaces of terminals 66, raisedvia 52, and dielectric layer 70 are substantially coplanar. Next, asshown in FIG. 20, opening 73 is formed in a lithography process toreveal metal pad 42D. In the step shown in FIG. 21, redistribution line74 and passivation layer 76 are formed, and wire bond structure 80 isformed to form package 82.

FIGS. 22 through 31 illustrate the intermediate stages in the formationof a package in accordance with alternative embodiments. Theseembodiments are similar to the embodiments shown in FIGS. 1 through 11except that the component devices are formed on another chip or waferwhen bonded. Referring to FIG. 22, wafer 2 is provided. Wafer 2 as shownin FIG. 22 is similar to the wafer 2 shown in FIG. 1, except passivationlayer 46 and dielectric layer 48 as shown in FIG. 1 are not formed.

Next, referring to FIG. 23, bond pads 50A and 50C are formed. Inaccordance with some embodiments of the present disclosure, photo resist84 is formed, and is then patterned to expose a portion of each of metalpads 42A and 42C. Metal pad 42B is covered by photo resist 84. Next,bond pads 50A and 50C are formed through plating, wherein bond pads 50Aand 50C may be formed of similar materials and have similar structure asbond pads 50A and 50C shown in FIG. 5. In addition, solder region 86 mayalso be formed by plating on top of bond pads 50A and 50C. Photo resist84 is then removed, followed by a reflow process to reflow solderregions 86.

FIG. 24 illustrates the formation of raised via 52. In accordance withsome embodiments of the present disclosure, photo resist 88 is formed,and is then patterned to expose a portion of metal pad 42B. Next, raisedvia 52 is formed through plating. Photo resist 88 is then removed.

Next, as shown in FIG. 25, chip 90 is provided. Chip 90 includessubstrate 92, and component devices 56A and 56B formed on substrate 92.In accordance with some embodiments, chip 90 is a discrete chip that hasbeen sawed from a wafer. Accordingly, the bonding as shown in FIG. 26 isa die-to-wafer bonding. In accordance with alternative embodiments, chip90 is a part of an unsawed wafer. Accordingly, the bonding as shown inFIG. 26 is a wafer-to-wafer bonding. Substrate 92 may be a siliconsubstrate, or may be formed of other materials such as a dielectricmaterial (such as silicon oxide, silicon carbide, or the like). Chip 90may include recess 94 extending into substrate 92. In accordance withsome embodiments, the depth D1 of recess 94 may be in the range betweenabout 5 μm and about 50 μm.

Chip 90 is aligned with the respective chip 10. Furthermore, bond layers60 in component devices 56A and 56B are aligned to the respective bondpads 50A and 50C, respectively. Chip 90 is then put into contact withchip 10. A reflow is then performed, so that solder regions 86 bondschip 10 and chip 90 together. In accordance with alternativeembodiments, instead of bonding chips 10 and 90 through solder bonding,metal-to-metal (such as copper-to-copper) direct bonding is performed.

Referring to FIG. 27, encapsulating material 96 is disposed into the gapbetween chips 10 and 90. When chip 90 is a discrete chip, there will bea plurality of identical chips 90, each bonded to one of the underlyingchips 10. Encapsulating material 96 may be an underfill or a moldingunderfill. Encapsulating material 96 also fills the recess 94 insubstrate 92.

Next, a planarization step such as CMP or mechanical grinding isperformed to reveal raised via 52. In accordance with some embodiments,remaining portions 92′ of substrate 92 are left in order to provide someprocess margin, so that component devices 56A and 56B are not damagedeven if over-polish occurs in the planarization step. In accordance withalternative embodiments, the top electrodes of component devices 56 areexposed after the planarization.

The remaining portions 92′ are then removed in an etching step, and theremaining structure is illustrated in FIG. 29. In accordance with someembodiments, remaining portions 92′ are silicon regions. In accordancewith alternative embodiments, remaining portions 92′ are formed of amaterial different from the removed substrate 92. For example, remainingportions 92′ may be formed of silicon oxide, while substrate 92 may beformed of silicon.

In a subsequent step, as shown in FIG. 30, top electrodes 66 are formed,as shown in FIG. 30. Redistribution line 74 and passivation layer 76 arethen formed. After the formation of redistribution line 74 andpassivation layer 76, opening 73 may be formed to expose bond pad 42D.Wire bond structure 80, which includes bond ball 80A and metal wire 80B,is then formed.

The embodiments of the present disclosure have some advantageousfeatures. In order to connect to the top terminals of the componentdevices having terminals on opposite surfaces, electrical connectionsneed to be made to connect to the top terminals. However, since thecomponent devices are thick, it is difficult to form redistributionlines that are thick enough to span the height of the component devices.In accordance with some embodiments of the present disclosure, raisedvias are formed to solve this problem. Furthermore, the raised vias maybe formed starting from the same metal layer on which the componentdevices are to be bonded to, and hence the manufacturing cost isreduced.

In accordance with some embodiments of the present disclosure, a methodincludes forming a metal layer extending into openings of a dielectriclayer to contact a first metal pad and a second metal pad, and bonding abottom terminal of a component device to the metal layer. The metallayer has a first portion directly underlying and bonded to thecomponent device. A raised via is formed on the metal layer, and themetal layer has a second portion directly underlying the raised via. Themetal layer is etched to separate the first portion and the secondportion of the metal layer from each other. The method further includescoating the raised via and the component device in a dielectric layer,revealing the raised via and a top terminal of the component device, andforming a redistribution line connecting the raised via to the topterminal.

In accordance with some embodiments of the present disclosure, a methodincludes forming a first bond pad and a second bond pad on a first metalpad and a second metal pad, respectively, bonding a bottom terminal of adiscrete device die onto the first bond pad, and plating a raised via onthe second bond pad. The raised via has a top surface substantiallylevel with or higher than a top surface of the discrete device die. Themethod further includes coating the raised via and the discrete devicedie in a polymer layer, and forming a redistribution line connecting atop terminal of the discrete device die to a top surface of the raisedvia.

In accordance with some embodiments of the present disclosure, a deviceincludes a first metal pad and a second metal pad at a same level, afirst bond pad and a second bond pad over and contacting the first metalpad and the second metal pad, respectively, and a discrete passivedevice over the first bond pad. The discrete passive device has a bottomterminal and a top terminal, with the bottom terminal electricallycoupling to the first bond pad. The device further includes a raised viaover and contacting the second bond pad, and a redistribution lineelectrically coupling the top terminal of the discrete passive device tothe raised via.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method comprising: forming a metal layerextending into openings of a dielectric layer to contact a first metalpad and a second metal pad; forming a component device overlapping afirst portion of the metal layer, wherein the forming the componentdevice comprises: depositing a conductive layer over the metal layer;depositing an insulator over the conductive layer; and patterning theconductive layer and the insulator; forming a raised via on the metallayer, wherein the metal layer has a second portion directly underlyingthe raised via; etching the metal layer to separate the first portionand the second portion of the metal layer from each other; encapsulatingthe raised via and the component device in an encapsulant; after theencapsulating, revealing the raised via and a top terminal of thecomponent device in a same process; and forming a redistribution lineconnecting the raised via to the component device.
 2. The method ofclaim 1, wherein the forming the component device further comprises:after the conductive layer and the insulator are patterned, forming anadditional dielectric layer to embed remaining portions of theconductive layer and the insulator therein; and patterning theadditional dielectric layer.
 3. The method of claim 2, wherein thepatterning the additional dielectric layer results in the metal layer tobe revealed.
 4. The method of claim 2 further comprising, before theconductive layer is deposited, forming a bottom terminal on the firstportion of the metal layer.
 5. The method of claim 1, wherein the raisedvia and the top terminal of the component device are revealed in aplanarization process, and wherein top surfaces of the raised via, thetop terminal, and the encapsulant are coplanar.
 6. The method of claim1, wherein the metal layer further comprises a third portion extendinginto an additional opening in the dielectric layer to contact a thirdmetal pad, and the method further comprises: when the metal layer isetched, removing the third portion of the metal layer to expose thethird metal pad; and forming a bond structure on the third metal pad. 7.The method of claim 1 further comprising planarizing the metal layer toform a planar top surface, wherein the component device and the raisedvia are formed on the planar top surface.
 8. The method of claim 1,wherein the same process comprises etching the encapsulant.
 9. A methodcomprising: forming a first dielectric layer to cover edge portions of afirst metal pad; depositing a metal layer, wherein the metal layercomprises a first portion extending into an opening in the firstdielectric layer to contact the first metal pad, and a second portionoverlapping a portion of the first dielectric layer; forming a bottomterminal on the first portion of the metal layer; forming a capacitoroverlapping the bottom terminal; forming a raised via on a third portionof the metal layer; encapsulating the raised via and the capacitor in anencapsulant; revealing a top terminal of the capacitor and the raisedvia; and electrically connecting the top terminal to the raised via. 10.The method of claim 9 further comprising, after the metal layer isdeposited, planarizing the metal layer.
 11. The method of claim 9,wherein the forming the capacitor comprises: depositing a bottomcapacitor electrode, an insulator over the bottom capacitor electrode,and a top capacitor electrode over the insulator layer-by-layer; andpatterning the bottom capacitor electrode, the insulator, and the topcapacitor electrode.
 12. The method of claim 9 further comprisingplanarizing the encapsulant until both of the top terminal of thecapacitor and the raised via are exposed.
 13. The method of claim 9further comprising etching the metal layer to remove a portion of themetal layer between the capacitor and the raised via.
 14. The method ofclaim 9 further comprising etching-through the encapsulant to reveal asecond metal pad.
 15. The method of claim 14 further comprising forminga wire bond on the second metal pad.
 16. A method comprising: forming ametal layer comprising a planar top surface, wherein the metal layercomprises a first via portion and a second via portion extending throughan underlying dielectric layer to contact a first metal pad and a secondmetal pad, respectively; forming a passive device on the metal layer andoverlapping the first via portion; forming a raised via on the metallayer and overlapping the second via portion, wherein the raised via iselectrically connected to a bottom terminal of the passive device, andwherein a top end of the passive device and the raised via are at a samelevel, and the passive device and the raised via have substantially asame height; etching a portion of the metal layer, with the portion ofthe metal layer connecting the first via portion to the second viaportion being removed in the etching; and electrically connecting a topterminal of the passive device to the raised via.
 17. The method ofclaim 16, wherein after the metal layer is etched, the underlyingdielectric layer is exposed.
 18. The method of claim 16 furthercomprising forming an encapsulant encapsulating the passive device andthe raised via therein.
 19. The method of claim 18 further comprisingforming a wire bond in the encapsulant.
 20. The method of claim 16further comprising forming a dielectric layer on sidewalls of thepassive device, wherein the etching a portion of the metal layer isperformed after the dielectric layer is formed.